Stealth Dicing™ process can be performed based on the wafer surface height, making it possible to reliably process wafers with significant warpage.
Wafer shape is measured using a high-resolution sensor to singulate at the optimal processing area.
High-quality processing can be achieved for sapphire, SiC, and GaAs using laser oscillators suited for each material.
DISCO is an alliance partner* of Hamamatsu Photonics, which owns the portfolio of patents for Stealth Dicing technology.
*System integrators who are business partners with comprehensive licensing for the portfolio of patents for Hamamatsu Stealth Dicing technology.
https://www.hamamatsu.com/jp/en/product/semiconductor-manufacturing-support-systems/stealth-dicing-technology/alliance-partners.html
Specification | Unit | ||
---|---|---|---|
Processing method | - | Stealth Dicing™ | |
Max. workpiece size | mm | Φ200 | |
X-axis (Chuck table) |
Processing range | mm | 210 |
Moving speed | mm/s | 1 ~ 1,000 | |
Y-axis (Chuck table) |
Processing range | mm | 210 |
Index step | mm | 0.0001 | |
Positioning accuracy | mm | 0.003/210 (Single error)0.002/5 |
|
Z-axis | Moving resolution | mm | 0.0001 |
Repeatability accuracy | mm | 0.001 | |
θ-axis (Chuck table) |
Max. rotating angle | deg | 380 |
Equipment dimensions (W×D×H) | mm | 950 × 1,732 × 1,800 | |
Equipment weight | kg | Approx. 1,800 |
*Product appearance, features, specifications, and other details may change due to technical
modifications.
*Please read the standard specification sheet thoroughly before use.
Equipment models that support Stealth Dicing are equipped with an SD engine, which has a modularized laser and optical system developed by Hamamatsu Photonics for DISCO.
Please feel free to contact us with any questions or inquiries.