DFG8541 is the next generation equipment of DFG8540, which is a dual-spindle standard model grinder that handles grinding of wafers 8 inches or smaller. DFG8541 can handle not only Si, but also hard and difficult-to-process materials such as SiC.
By adding a high-torque spindle to the list of optional specifications, a wider variety of materials can be processed with DFG8541. In addition, by improving various mechanisms such as wafer shape adjustment (affects thickness variation) and wafer transfer and cleaning operations, high-quality processing can be achieved.
High-precision wafer shape adjustment can be performed on the screen using an electric fine adjustment axis. Contact with the wafer is minimized with a non-contact centering function that uses a camera, and a high level of cleanliness can be achieved through atomizing nozzle cleaning.
A new GUI and control system make intuitive operation possible. In addition, multiple functions that improve the usability of the equipment have been added, such as recipe selection per wafer for wafers in the same cassette, tape mounting irregularity detection, and slanted wafer storage and empty slot detection.
With an optimized layout and built-in vacuum unit, the footprint is 15% smaller than DFG8540. In addition, air consumption has also been reduced by 50% due to the adoption of new air spindles.
Specification | Unit | ||
---|---|---|---|
Supported workpiece size | - |
Φ8 inch When using universal chuck table: Φ4, 5, 6, 8 inches |
|
Grinding method | - | In-feed grinding with workpiece rotation | |
Grinding wheel | - | Φ200 mm diamond wheel | |
Spindle | Rated output | kW | 4.2 |
Rotation speed range | min‐1 | 1,000 - 7,000 | |
Equipment dimensions (W x D x H) | mm | 1,100 × 2,800 × 1,800 | |
Equipment weight | kg | Approx.3,000 |
Machine type |
Spindle |
C/T |
Machine dimentions(W × D × H) |
Machine weight(kg) |
Please feel free to contact us with any questions or inquiries.