Achieves stable die separation for wafers and DAF that have a modified layer formed inside them using the Stealth DicingTM process.
High productivity and high device reliability are achieved with the newly developed expansion unit, workpiece inversion mechanism, and more.
Particle adhesion is reduced by performing transfer, processing, and cleaning after inverting the workpiece. This leads to improved device reliability and yield.
In previous models, multiple auxiliary equipment were installed in the area around the main equipment. DDS2320 achieves a smaller footprint by having the auxiliary equipment installed internally.
Specification | Unit | ||
---|---|---|---|
Max. workpiece size | mm | Φ300 (Φ12inch tape frame only) |
|
Expansion stage | Temperature setting range | ℃ | -2–30℃(variable) |
Max. upthrust amount | mm | 30 | |
Upthrust amount setting range | mm | 0–30 (step: 0.001) | |
Max. upthrust speed | mm/s | 400 | |
Upthrust speed setting range | mm/s | 0.001–400 (step: 0.001) | |
Hot air, temperature setting range | ℃ | 150–250ºC (variable) | |
Hot air, flow rate setting range | L/mm | 0–30 (variable) | |
Equipment dimensions (W × D × H) | mm | 1,300 × 1,800 × 1,800 | |
Equipment weight | kg | Approx. 1,126 |
*Product appearance, features, specifications, and other details may change due to technical
modifications.
*Please read the standard specification sheet thoroughly before use.
Please feel free to contact us with any questions or inquiries.